Gas supply system

  • Batch and fully continuous-flow operation
  • Pressure: up to 170 bar
  • Flow rate: 10-5000 mL/min
  • Applicable gases: synthetic air, hydrogen, ethylene, methane, ethane, helium, NO, N2O, nitrogen, CO, argon
  • Suitable for feeding different gases
  • Easy handling
  • Minimal maintenance required
  • In-line gas filter 2 μm
  • Manual dosage mode: optional
  • Overpressure protection: mechanic and electronic
  • Optional mode of control (PC or touchscreen)


The universal gas supply equipment can be connected to existing flow reactor systems or other equipments. It expands the application possibilities of reactors at high pressure along different mass flow. Up to 13 different gases can be used with analogue setting possibility. Hydrogenation, oxidation or other gas required reactions can be performed with it.